JPS6322576B2 - - Google Patents
Info
- Publication number
- JPS6322576B2 JPS6322576B2 JP59092992A JP9299284A JPS6322576B2 JP S6322576 B2 JPS6322576 B2 JP S6322576B2 JP 59092992 A JP59092992 A JP 59092992A JP 9299284 A JP9299284 A JP 9299284A JP S6322576 B2 JPS6322576 B2 JP S6322576B2
- Authority
- JP
- Japan
- Prior art keywords
- nitrocellulose
- polymer
- layer
- refractive index
- outermost
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59092992A JPS60237450A (ja) | 1984-05-11 | 1984-05-11 | 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59092992A JPS60237450A (ja) | 1984-05-11 | 1984-05-11 | 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60237450A JPS60237450A (ja) | 1985-11-26 |
JPS6322576B2 true JPS6322576B2 (en]) | 1988-05-12 |
Family
ID=14069859
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59092992A Granted JPS60237450A (ja) | 1984-05-11 | 1984-05-11 | 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60237450A (en]) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4759990A (en) * | 1985-11-27 | 1988-07-26 | Yen Yung Tsai | Composite optical element including anti-reflective coating |
JPH0529473Y2 (en]) * | 1986-03-14 | 1993-07-28 | ||
JPH0529474Y2 (en]) * | 1986-03-14 | 1993-07-28 | ||
JPH0644148B2 (ja) * | 1986-06-25 | 1994-06-08 | ダイセル化学工業株式会社 | 反射防止コ−テツドペリクルの製法 |
JP2535971B2 (ja) * | 1987-11-05 | 1996-09-18 | 三井石油化学工業株式会社 | ペリクル |
JP2733483B2 (ja) * | 1988-12-13 | 1998-03-30 | 三井化学株式会社 | 高光線透過性防塵体の製造方法 |
CA2005096C (en) * | 1988-12-13 | 1999-03-23 | Tokinori Agou | High light-transmissive dust-proof body and method of preparing same |
US5061024C1 (en) * | 1989-09-06 | 2002-02-26 | Dupont Photomasks Inc | Amorphous fluoropolymer pellicle films |
US6926952B1 (en) | 1998-01-13 | 2005-08-09 | 3M Innovative Properties Company | Anti-reflective polymer constructions and method for producing same |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5846301A (ja) * | 1981-09-14 | 1983-03-17 | Toray Ind Inc | 反射防止膜を有する透明材料 |
-
1984
- 1984-05-11 JP JP59092992A patent/JPS60237450A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60237450A (ja) | 1985-11-26 |
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